Positive photoresist composition

A positive photoresist composition comprising:

• (A) an alkali-soluble resin ingredient;
• and
• (B) a quinonediazide ester ingredient,
• wherein the ingredient (B) comprises:
• (b1) a quinonediazide ester represented by following Formula (I):
• 6
• wherein each of Ds is independently a hydrogen atom or a 1,2-naphthoquinonediazido-5-sulfonyl group, where at least one of Ds is a 1,2-naphthoquinonediazido-5-sulfonyl group;
• and
• (b2) a quinonediazide ester, other than the quinonediazide ester (b1), represented by following Formula (II):
• 7
• wherein each of R1, R2, R3, R4, R5, R6, R7, and R8 is independently a hydrogen atom, a halogen atom, an alkyl group containing 1 to 6 carbon atoms, an alkoxy group containing 1 to 6 carbon atoms, or a cycloalkyl group containing 3 to 6 carbon atoms;
• each of R9, R10, and R11 is independently a hydrogen atom or an alkyl group containing 1 to 6 carbon atoms;
• Q is a hydrogen atom or an alkyl group containing 1 to 6 carbon atoms, or Q is combined with R9 to form a cycloalkyl group containing 3 to 6 carbon members or a residue represented by following Formula (III):
• 8
• wherein each of R12 and R13 is independently a hydrogen atom, a halogen atom, an alkyl group containing 1 to 6 carbon atoms, an alkoxy group containing 1 to 6 carbon atoms, or a cycloalkyl group containing 3 to 6 carbon atoms;
• and
• c is an integer from 1 to 3;
• each of Ds is independently a hydrogen atom or a 1,2-naphthoquinonediazido-5-sulfonyl group, where at least one of Ds is a 1,2-naphthoquinonediazido-5-sulfonyl group;
• each of a and b is independently an integer from 1 to 3;
• d is an integer from 0 to 3;
• and
• n is an integer from 0 to 3,
• wherein, when n is 0, Q is the residue represented by Formula (III) or is combined with R9 to form a cycloalkyl group containing 3 to 6 carbon atoms.