Exposure apparatus, exposure method and device production method
AssigneeNikon Corporation
InventorsHiroyuki Nagasaka, Naomasa Shiraishi
Life of this patent
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Abstract
An exposure apparatus comprising a light source which emits a light including a main light having a wavelength to expose a substrate and a sub light having a different wavelength from that of the main light collaterally generated in accordance with an oscillation of the main light, a main optical system which introduces a light from the light source to the substrate via the mask, a light sensor having sensitivity to a wavelength including the main light, and a separation device disposed on a light path from the light source to the light sensor, the separation device separating the main light and the sub light.
Claims20
An exposure apparatus which exposes a substrate via a mask being formed a pattern, comprising:
- a light source which emits a light including a main light having a wavelength to expose said substrate and a sub light having a different wavelength from that of the main light collaterally generated in accordance with an oscillation of the main light;
- a main optical system which introduces a light from said light source to said substrate via said mask;
- a light sensor having sensitivity to a wavelength including at least said main light;
- and
- a separation device disposed on a light path from said light source to said light sensor, which separates said main light and said sub light.
An exposure apparatus which exposes a substrate via a mask being for a pattern, comprising:
- a light source which emits a light including a main light having a wavelength to expose said substrate and a sub light having a different wavelength from that of the main light collaterally generated in accordance with an oscillation of the main light;
- a main optical system which introduces the light from said light source to said substrate via said mask;
- a first light sensor having sensitivity to a wavelength range including wavelengths of said main light and said sub light;
- a second light sensor having sensitivity to a wavelength range including at least a wavelength of said sub light;
- a first branch optical system disposed on a light path of said light in said main optical system, which introduces a part of said light to said first light sensor;
- a second optical system disposed on a light path of said light in said main optical system or in said first branch optical system, which introduces a part of said light to said second light sensor;
- and
- a separation device disposed between said second branch optical system and said second light sensor, which separate& said main light and said sub light.
An exposure method for exposing a substrate by using an exposure light including a main light having a wavelength to expose the substrate and a sub light having a different wavelength from that of the main light via a mask being formed a pattern, including the steps of:
- separating said sub light from said exposure light including said main light and said sub light;
- measuring energy of said exposure light after the separation;
- and
- controlling a cumulative exposure light amount on said substrate based on the measurement result.
An exposure method for exposing a substrate by using an exposure light including a main light having a wavelength to expose the substrate and a sub light having a different wavelength from that of the main light via a mask being formed a pattern, including the steps of:
- branching a part of said exposure light including said main light and said sub light;
- separating said sub light from said branched exposure light;
- measuring energy of said exposure light after the separation;
- and
- controlling a cumulative exposure light amount on said substrate based on the measurement result.
An exposure method for exposing a substrate using an exposure light including a main light having a wavelength to expose the substrate and a sub light having a different wavelength from that of the main light via a mask being formed a pattern, including the steps of:
- measuring first energy of said exposure light including said main light and said sub light;
- separating said main light from said exposure light including said main light and said sub light;
- measuring second energy of said exposure light after separating said main light;
- and
- correcting said first energy based on said second energy and controlling a cumulative exposure light amount on said substrate based on the corrected first energy.
Dependencies are inferred from the claim text.