System and method for active control of spacer deposition

A method for regulating spacer deposition, comprising:

• defining a wafer as having one or more portions, where spacer is deposited onto the one or more portions;
• directing light onto the spacer deposited onto the one or more portions;
• collecting light reflected from the spacer deposited onto the one or more portions;
• measuring the reflected light to determine at least one of spacer thickness, spacer uniformity and spacer coverage in the one or more portions;
• analyzing the reflected light by comparing the reflected light to one or more signatures associated with at least one of known spacer thickness values, known spacer uniformity values and known spacer coverage values;
• and
• adjusting one or more spacer deposition components to regulate spacer deposition.

A method for regulating spacer deposition, comprising:

• partitioning a wafer into a plurality of grid blocks;
• using one or more spacer deposition components to deposit spacer on the wafer, each spacer deposition component functionally corresponding to a respective grid block;
• determining spacer thickness on portions of the wafer, each portion corresponding to a respective grid block;
• and
• coordinating control of the spacer deposition components in accordance with the determined spacer thickness associated with the respective grid blocks of the wafer.