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US 2003/0152861 A1Published application
Positive photoresist composition
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsMitsuo Hagihara, Toshiaki Tachi, Kenji Maruyama
Life of this patent
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Abstract
A composition includes (A) an alkali-soluble resin; and (B) (b-1) a compound of Formula (I): 1 wherein Ds are each a hydrogen atom or a naphthoquinonediazidosulfonyl group; and (b2) a quinonediazide ester of, for example, methyl gallate.
Claims3
A positive photoresist composition comprising:
- (A) an alkali-soluble resin ingredient;
- and
- (B) a quinonediazide ester ingredient,
- wherein the ingredient (B) comprises:
- (b1) a quinonediazide ester represented by following Formula (I):
- 6
- wherein each of Ds is independently a hydrogen atom or a 1,2-naphthoquinonediazido-5-sulfonyl group, where at least one of Ds is a 1,2-naphthoquinonediazido-5-sulfonyl group;
- and
- (b2) a quinonediazide ester represented by following Formula (II):
- 7
- wherein each of Ds is independently a hydrogen atom or a 1,2-naphthoquinonediazido-5-sulfonyl group, where at least one of Ds is a 1,2-naphthoquinonediazido-5-sulfonyl group;
- and R1 is an alkyl group containing 1 to 6 carbon atoms.
9 more elements
Dependencies are inferred from the claim text.