Scanning exposure method and apparatus, and device manufacturing method using the same
AssigneeCanon Kabushiki Kaisha
InventorsKAZUNORI IWAMOTO, NOBUYOSHI DEGUCHI
Life of this patent
Estimating the term…
Abstract
A scan type exposure apparatus in which a pattern formed on an original is transferred a substrate while relatively moving the original and the substrate relative to a projection optical system, wherein a stage is servo controlled on the basis of measurement of X and Y coordinates (x,y) and yawing component θ, and wherein yawing measuring systems provided in relation to X and Y directions are selectively used in accordance with the state of operation of the apparatus so that the yawing component measurement direction is laid on preferable one of the X and Y directions.
Claims20
A scan type exposure apparatus, wherein a pattern is transferred sequentially to different regions of a substrate through a step-and-scan operation including a combination of stepwise motion of the substrate to an original and scanning exposure, moving the original and the substrate in a Y direction, said apparatus comprising:
- a stage for carrying a substrate thereon and being movable in the Y direction and an X direction orthogonal thereto;
- first measuring means for measuring yawing of said stage by using a first reflection surface along the Y direction of a mirror mounted on said stage;
- and
- second measuring means for measuring yawing of said stage by using a second reflection surface along the X direction of a mirror mounted on said stage.
A scanning exposure method, comprising the steps of
- preparing an original and a substrate;
- measuring a position of the substrate by use of an alignment scope and, after the measurement, moving the substrate;
- and
- sequentially transferring a pattern of the original to different regions on the substrate in accordance with a step-and-scan operation including a combination of stepwise motion of the substrate relative to the original and scanning exposure while moving the original and the substrate;
- wherein, between the scanning exposure and the movement after measurement by the alignment scope, a measurement direction with respect to which yawing measurement to a stage using a laser interferometer is made different.
A scanning exposure method, comprising the steps of:
- preparing an original and a substrate;
- measuring a position of the substrate by use of an alignment scope and, after the measurement, moving the substrate;
- and
- sequentially transferring a pattern of the original to different regions on the substrate in accordance with a step-and-scan operation including a combination of stepwise motion of the substrate relative to the original and scanning exposure while moving the original and the substrate;
- wherein, for the scanning exposure, yawing measurement to a stage is performed by using a laser interferometer and in relation to a direction the same as the scanning movement direction, and wherein, for the movement after measurement by the alignment scope, yawing measurement to the stage is performed by using a laser interferometer and in relation to a direction orthogonal to the movement direction.
Dependencies are inferred from the claim text.