Pellicle distortion reduction
AssigneeInternational Business Machines Corporation
InventorMichael S. Hibbs
Life of this patent
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Abstract
The invention provides systems and a method for reducing pellicle distortion. One feature of the invention reduces distortion of a pellicle by providing an airtight mounting structure for coupling a pellicle to a mask; and a port on the mounting structure though which a pressure difference can be created between the interior portion and an exterior environment. Hence, distortion can be reduced by controlling the pressure in the interior portion between the pellicle, the pellicle mounting structure and the mask. Another feature places an aerodynamic fairing adjacent the mask to reduce aerodynamic drag and, hence, suppress turbulent air flow over the pellicle. The features can be used separately or in combination.
Claims20
A mounting system for a pellicle comprising:
- a mounting structure for coupling a pellicle to a mask, wherein a sealed interior portion is formed between the pellicle, the mask and the mounting structure;
- and
- a port on the mounting structure through which a pressure difference can be created between the interior portion and an exterior environment.
A pellicle mounting system for a mask, the mounting system comprising:
- an aerodynamic fairing adjacent the mask, the fairing having a taper to reduce aerodynamic drag on the pellicle.
A method of reducing distortion of a pellicle for a mask, the method comprising the steps of:
- sealing the pellicle to the mask using an airtight mounting structure such that an interior portion is created between the pellicle, the mask and the mounting structure;
- and
- regulating a pressure in the interior portion to maintain a flat surface on the pellicle.
Dependencies are inferred from the claim text.