Gap gauge
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsPing-Ling Fan, Te-Hsiang Liu
Life of this patent
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Abstract
An apparatus and method for preventing damage to a chamber wall by a baffle plate in a semiconductor fabrication system during a semiconductor fabrication operation is disclosed herein. An electrostatic chuck is associated with the semiconductor fabrication system. A gauge for measuring a gap between said baffle plate and the chamber wall can be utilized to prevent damage to the chamber wall by the baffle plate during a movement of the electrostatic chunk during the semiconductor fabrication operation. Such a semiconductor fabrication operation can comprise, for example, a wet cleaning semiconductor operation.
Claims20
An apparatus for preventing damage to a chamber wall by a baffle plate in a semiconductor fabrication system during a semiconductor fabrication operation, said apparatus comprising:
- an electrostatic chuck associated with said semiconductor fabrication system;
- a gauge for measuring a gap between said baffle plate and said chamber wall, hereby preventing damage to said chamber wall by said baffle plate during a movement of said electrostatic chunk during said semiconductor fabrication operation of said semiconductor fabrication system.
A method for preventing damage to a chamber wall by a baffle plate in a semiconductor fabrication system during a semiconductor fabrication operation, said method comprising the steps of:
- moving an electrostatic chuck associated with said semiconductor fabrication system during said semiconductor fabrication operation;
- and
- measuring a gap between said between said baffle plate and said chamber wall utilizing a gauge integrated with said semiconductor fabrication system, in response to moving said electrostatic chunk to thereby prevent damage to said chamber wall by said baffle plate.
Dependencies are inferred from the claim text.