Hard wear resistant film, process for forming hard film, and target used to form hard film
AssigneeKabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.)
InventorsKenji Yamamoto, Toshiki Sato
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Abstract
Disclosed is a hard film exhibiting high wear resistance, with composition of (Alb,[Cr1-αVα]C(C1-dNd), satisfying the condition of 0.5≦b≦0.8, 0.2≦c≦0.5, b+c=1, 0.05≦α≦0.95, 0.5≦d≦1 (where b and c each represents atomic ratio of Al and Cr+V, and d denotes atomic ratio of N, a denotes atomic ratio of V.), or with composition of (Mα,Alb,[Cr1-αVα]C)(C1-dNd), wherein M is at least one element selected from Ti, Nb, W, Ta and Mo and satisfying the condition of 0.02≦a≦0.3, 0.5≦b≦0.8, 0.05≦c, a+b+c=1, 0.5≦d≦1, 0≦α≦1 (where a represents atomic ratio of M). However, the case is exempted where M is Ti and the value of α is 0.
Claims31
A hard wear resistant film, composed of (Alb,[Cr1-αVα]c)(C1-dNd), and the composition of the components satisfies the conditions:
- 0.5≦b≦0.8,
- 0.2≦c≦0.5,
- b+c=1,
- 0.05≦α≦0.95,
- 0.5≦d≦1
- (where b and c each represents atomic ratio of Al and Cr+V, d denotes atomic ratio of N, and α represents atomic ratio of V. The same applies hereinafter.).
A hard wear resistant film, composed of (Ma,Alb,[Cr1-αVα]c)(C1-dNd), where M is at least one element selected from Ti, Nb, W, Ta and Mo, and satisfying the conditions:
- 0.02≦a≦0.3,
- 0.5≦b≦0.8,
- 0.05≦c,
- a+b+c=1,
- 0.5≦d≦1,
- 0≦α≦1
- (where a, b and c each represents atomic ratio of M, Al, and Cr+V, d denotes atomic ratio of N, and α represents atomic ratio of V. The same applies hereinafter. However, the case is exempted where M is Ti, and the value of α is 0.).
A target for forming a hard film, comprising Al, Cr and V, or M (where M is at least one element selected from Ti, Nb, W, Ta and Mo), Al, Cr and/or V, and having relative density of 95% or more.
Dependencies are inferred from the claim text.