Reflection type projection optical system, exposure apparatus and device fabrication method using the same
AssigneeCanon Kabushiki Kaisha
InventorChiaki Terasawa
Life of this patent
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Abstract
A reflection type projection optical system for projecting a pattern on an object surface onto an image surface and forming an imaging system that forms an intermediate image between the object surface and image surface includes four or more mirrors arranged substantially as a coaxial system to reflect light from an object side to an image side, reflection surfaces on the four or more mirrors forming the same direction for forming a reflection angle.
Claims20
A reflection type projection optical system for projecting a pattern on an object surface onto an image surface and for serving as an imaging system that forms an intermediate image between the object surface and image surface, said reflection type projection optical system comprising four or more mirrors arranged substantially as a coaxial system to reflect light from an object side to an image side, and reflection surfaces on the four or more mirrors forming the same direction for forming a reflection angle.
A reflection type projection optical system for projecting a pattern on an object surface onto an image surface, said reflection type projection optical system comprising four mirrors that include, in order from an object side to an image side, a concave mirror, a convex mirror, a convex mirror and a concave mirror, and substantially form a coaxial system, and said four mirrors serving as a twice-imaging system that forms an intermediate image between the object side and the image side.
An exposure apparatus that uses ultraviolet light, far ultraviolet light, vacuum ultraviolet light or extreme ultraviolet light as exposure light and irradiates the exposure light onto an object to be exposed through a reflection type projection optical system so as to expose the object,
- wherein said reflection type projection optical system is adapted to project a pattern on an object surface onto an image surface and to serve as an imaging system that forms an intermediate image between the object surface and image surface, said reflection type projection optical system comprising four or more mirrors arranged substantially as a coaxial system to reflect light from an object side to an image side, reflection surfaces on the four or more mirrors forming the same direction for forming a reflection angle.
An exposure apparatus that uses ultraviolet light, far ultraviolet light, vacuum ultraviolet light or extreme ultraviolet light as exposure light and irradiates the exposure light onto an object to be exposed through a reflection type projection optical system so as to expose the object,
- wherein said reflection type projection optical system is adapted to project a pattern on an object surface onto an image surface, said reflection type projection optical system comprising four mirrors that include, in order from an object side to an image side, a concave mirror, a convex mirror, a convex mirror and a concave mirror, and substantially form a coaxial system, said four mirrors serving as a twice-imaging system that forms an intermediate image between the object side and the image side.
A device fabricating method comprising the steps of:
- exposing an object using an exposure apparatus;
- and
- performing a predetermined process for the exposed object,
- wherein said exposure apparatus uses ultraviolet light, far ultraviolet light, vacuum ultraviolet light or extreme ultraviolet light as exposure light and irradiates the exposure light onto the object through a reflection type projection optical system so as to expose the object,
- wherein said reflection type projection optical system is adapted to project a pattern on an object surface onto an image surface and to form an imaging system that forms an intermediate image between the object surface and image surface, said reflection type projection optical system comprising four or more mirrors arranged substantially as a coaxial system to reflect light from an object side to an image side, reflection surfaces on the four or more mirrors forming the same direction for forming a reflection angle.
A device fabricating method comprising the steps of:
- exposing an object using an exposure apparatus;
- and
- performing a predetermined process for the exposed object,
- wherein the exposure apparatus uses ultraviolet light, far ultraviolet light, vacuum ultraviolet light or extreme ultraviolet light as exposure light and irradiates the exposure light onto the object through a reflection type projection optical system so as to expose the object,
- wherein said reflection type projection optical system is adapted to project a pattern on an object surface onto an image surface, said reflection type projection optical system comprising four mirrors that include, in order from an object side to an image side, a concave mirror, a convex mirror, a convex mirror and a concave mirror, and substantially form a coaxial system, said four mirrors serving as a twice-imaging system that forms an intermediate image between the object side and the image side.
Dependencies are inferred from the claim text.