Reflection type projection optical system, exposure apparatus and device fabrication method using the same
OwnerChiaki Terasawainventor
Life of this patent
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Abstract
A reflection type projection optical system includes six mirrors that serve substantially as a coaxial system, and include, in order from an object side to an image side, a first mirror, a second mirror, a third mirror, a fourth mirror, a fifth mirror, and a sixth mirror to sequentially reflect light, wherein the reflection type projection optical system serves as an imaging system that forms an intermediate image along an optical path between the third mirror and the fifth mirror, and wherein a displacement direction of a principal ray viewed from an optical axis from the first mirror to the second mirror is reverse to that from the third mirror to the sixth mirror.
Claims17
A reflection type projection optical system comprising six mirrors that serve substantially as a coaxial system, and include, in order from an object side to an image side, a first mirror, a second mirror, a third mirror, a fourth mirror, a fifth mirror, and a sixth mirror to sequentially reflect light,
- wherein said reflection type projection optical system serves as an imaging system that forms an intermediate image along an optical path between the third mirror and the fifth mirror, and
- wherein a displacement direction of a principal ray viewed from an optical axis from the first mirror to the second mirror is reverse to that from the third mirror to the sixth mirror.
An exposure apparatus comprising:
- a reflection type projection optical system;
- a first stage for holding a mask so as to position a pattern on the mask at an object surface;
- a second stage for holding a substrate so as to position a photosensitive layer applied onto the substrate at an image surface;
- an illumination apparatus for illuminating the mask using circular extreme ultraviolet light corresponding to a field of said reflection type projection optical system;
- and
- a mechanism for synchronously scanning said first and second stages while said illumination apparatus illuminates the mask using the extreme ultraviolet light,
- wherein a reflection type projection optical system comprises six mirrors that serve substantially as a coaxial system, and include, in order from an object side to an image side, a first mirror, a second mirror, a third mirror, a fourth mirror, a fifth mirror, and a sixth mirror to sequentially reflect light,
- wherein said reflection type projection optical system serves as an imaging system that forms an intermediate image along an optical path between the third mirror and the fifth mirror, and
- wherein a displacement direction of a principal ray viewed from an optical axis from the first mirror to the second mirror is reverse to that from the third mirror to the sixth mirror.
A device fabricating method comprising the steps of:
- exposing an object using an exposure apparatus;
- and
- performing a predetermined process for the exposed object,
- wherein an exposure apparatus includes:
- a reflection type projection optical system;
- a first stage for holding a mask so as to position a pattern on the mask at an object surface;
- a second stage for holding a substrate so as to position a photosensitive layer applied onto the substrate at an image surface;
- an illumination apparatus for illuminating the mask using circular extreme ultraviolet light corresponding to a field of said reflection type projection optical system;
- and
- a mechanism for synchronously scanning said first and second stages while said illumination apparatus illuminates the mask using the extreme ultraviolet light,
- wherein a reflection type projection optical system comprises six mirrors that serve substantially as a coaxial system, and include, in order from an object side to an image side, a first mirror, a second mirror, a third mirror, a fourth mirror, a fifth mirror, and a sixth mirror to sequentially reflect light,
- wherein said reflection type projection optical system serves as an imaging system that forms an intermediate image along an optical path between the third mirror and the fifth mirror, and
- wherein a displacement direction of a principal ray viewed from an optical axis from the first mirror to the second mirror is reverse to that from the third mirror to the sixth mirror.
Dependencies are inferred from the claim text.