Phase measuring method and apparatus

A phase measuring apparatus for measuring, based on wavefront information, phase information dependent upon an angle incident onto a film applied onto an object to be measured, said phase measuring apparatus comprising:

• a reflector for condensing light from a light source with a certain incident angle range, and for introducing the light to the object;
• and
• a detector for detecting the wavefront information of the light reflected on the object.

An exposure apparatus comprising an optical element measured by a phase measuring apparatus for measuring phase characteristics of a film applied onto an object to be measured, said phase measuring apparatus comprising a shearing interference system for providing incident light onto the object or light reflected on the object with shearing interference, a detector for detecting shearing interference information, and a computing unit for calculating the phase characteristics of the film based on the shearing interference information.

A phase measuring method for measuring phase information dependent on an angle of incidence onto a film applied onto an object to be measured, said phase measuring method comprising the steps of:

• introducing light to substantially one spot on the object and providing light from the one spot with shearing interference;
• and
• partially differentiating, with respect to a position on the film and/or the angle, phase information dependent upon the position and the angle.

An exposure apparatus comprising an optical element whose phase has been measured by a phase measuring method that measures phase information dependent on an angle of incidence onto a film applied onto an object to be measured, said phase measuring method comprising the steps of introducing light to substantially one spot on the object and for providing light from the one spot with shearing interference, and partially differentiating, with respect to a position on the film and/or the angle, phase information dependent upon the position and the angle.

A phase measuring method that detects phase characteristics dependent on an angle incident on a film as an object to be measured, said method comprising the steps of:

• introducing light to the object while correlating a position incident on the film and the angle incident on the film with each other;
• and
• measuring a phase distribution of the light from the object utilizing shearing interference.

An exposure apparatus having an optical element measured by a phase measuring method that detects phase characteristics dependent on an angle incident on a film applied onto an object to be measured, said method including the steps of introducing light onto the object while correlating a position incident on the film and the angle incident on the film with each other, and measuring a phase distribution of the light from the object using shearing interference.

An exposure apparatus having an optical element measured by a phase measuring apparatus for measuring phase information dependent upon an angle incident on a film applied onto an object to be measured, based on interference information, said phase measuring apparatus including a condenser for condensing light from a light source, a reflector, provided on a condensing point for the light, for reflecting the light and introducing the light at a divergent state to the object, a grating for diffracting the light that has been reflected on the object, and a detector for detecting the interference information based on two beams whose wavefronts have been mutually offset by said grating.

A device fabrication method comprising the steps of:

• exposing onto a target by using an exposure apparatus;
• and
• developing the exposed object, wherein said exposure apparatus has an optical element measured by a phase measuring method that detects phase characteristics dependent on an angle incident on a film applied onto an object to be measured, said method including the steps of introducing light onto the object while correlating a position incident on the film and the angle incident on the film with each other, and measuring a phase distribution of the light from the object using shearing interference.

A device fabrication method comprising the steps of:

• exposing onto a target by using an exposure apparatus;
• and
• developing the exposed target, wherein an exposure apparatus has an optical element measured by a phase measuring apparatus for measuring phase information dependent upon an angle incident on a film applied onto an object to be measured, based on interference information, said phase measuring apparatus including a condenser for condensing light from a light source, a reflector, provided on a condensing point for the light, for reflecting the light and introducing the light at a divergent state to the object, a grating for diffracting the light that has been reflected on the object, and a detector for detecting the interference information based on two beams having offset wavefronts by said grating.