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US 2003/0143496 A1Published application
Device manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorsMitsuaki Amemiya, Shunichi Uzawa, Keiko Chiba, Yutaka Watanabe
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Abstract
A device manufacturing method includes a first step for executing a multiple exposure to a first layer on a substrate, by use of a plurality of first masks, and a second step, to be executed after the first step, for executing a multiple exposure to a second layer on the substrate, by use of a plurality of second masks, wherein one of the second masks has a pattern portion of the same design rule as that of one of the first masks.
Claims9
A device manufacturing method, comprising:
- a first step for executing a multiple exposure to a first layer on a substrate, by use of a plurality of first masks;
- and
- a second step, to be executed after said first step, for executing a multiple exposure to a second layer on the substrate, by use of a plurality of second masks;
- wherein one of the second masks has a pattern portion of the same design rule as that of one of the first masks.
1 more element
Dependencies are inferred from the claim text.