Positive photoresist composition and method of patterning resist thin film for use in inclined implantation process

A positive photoresist composition comprising:

• (A) an alkali-soluble resin having a weight average molecular weight (Mw) in terms of polystyrene of from 1500 to 10000,
• wherein a resin film 1 μm thick prepared from the alkali-soluble resin completely dissolves in 2.38% by weight tetramethylammonium hydroxide (TMAH) aqueous solution at 23° C. within ten seconds, the resin film being prepared by dissolving the alkali-soluble resin in a solvent to yield a solution, applying the solution to a substrate to yield a film, and drying the film at 110° C. for 90 seconds;
• (B) a quinonediazide ester represented by following
• 12
• wherein each of R1, R2, R3, R4, R5, R6, R7, and R8 is independently a hydrogen atom, a halogen atom, an alkyl group containing 1 to 6 carbon atoms, an alkoxy group containing 1 to 6 carbon atoms, or a cycloalkyl group;
• each of R9, R10, and R11 is independently a hydrogen atom or an alkyl group containing 1 to 6 carbon atoms;
• Q is a hydrogen atom or an alkyl group containing 1 to 6 carbon atoms, or Q is combined with R9 to form a cycloalkyl group containing 3 to 6 carbon members or a residue represented by following Formula (II):
• 13
• wherein each of R12 and R13 is independently a hydrogen atom, a halogen atom, an alkyl group containing 1 to 6 carbon atoms, an alkoxy group containing 1 to 6 carbon atoms, or a cycloalkyl group;
• and
• c is an integer of from 1 to 3;
• each of Ds is independently a hydrogen atom or a 1,2-naphthoquinonediazido-5-sulfonyl group, where at least one of Ds is a 1,2-naphthoquinonediazido-5-sulfonyl group;
• each of a and b is independently an integer of from 1 to 3;
• d is an integer of from 0 to 3;
• and
• n is an integer of from 0 to 3;
• and
• (C) a phenolic compound containing an acid-decomposable group and represented by following Formula (III):
• 14
• wherein each of R1, R2, R3, R4, R5, R6, R7, and R8 is independently a hydrogen atom, a halogen atom, an alkyl group containing 1 to 6 carbon atoms, an alkoxy group containing 1 to 6 carbon atoms, or a cycloalkyl group;
• each of R9, R10, and R11 is independently a hydrogen atom or an alkyl group containing 1 to 6 carbon atoms;
• Q is a hydrogen atom or an alkyl group containing 1 to 6 carbon atoms, or Q is combined with R9 to form a cycloalkyl group containing 3 to 6 carbon members or a residue represented by following Formula (IV):
• 15
• wherein each of R12 and R13 is independently a hydrogen atom, a halogen atom, an alkyl group containing 1 to 6 carbon atoms, an alkoxy group containing 1 to 6 carbon atoms, or a cycloalkyl group;
• and
• c is an integer of from 1 to 3;
• each of Es is independently a hydrogen atom or a 1-ethoxyethyl group where at least one of Es is a 1-ethoxyethyl group;
• each of a and b is independently an integer of from 1 to 3;
• d is an integer of from 0 to 3;
• and
• n is an integer of from 0 to 3.