Manufacturing method of photomask

A manufacturing method of a photomask, the method comprising applying a resist directly to a substrate and patterning the resist to produce a photomask with a resist pattern, the method further comprising a process of attaching a temporary pellicle to the substrate before an inspection process after forming the resist pattern by applying the resist, carrying out an exposure/drawing process and a developing process and a process of applying a real pellicle in place of the temporary pellicle to the photomask which has passed through the subsequent inspection process and passed the inspection.

A manufacturing method of a photomask, the method comprising applying a resist directly to a substrate and patterning the resist to produce a photomask with a resist pattern, wherein a series of processes involving a process applying the resist, an exposure/drawing process, a developing process, an inspection process, a process of attaching a pellicle and a final inspection process are carried out in a treating system disposed in a closed system.

A manufacturing method of a photomask, the method comprising applying a resist directly to a substrate and patterning the resist to produce a photomask with a resist pattern, wherein after the resist is applied to the substrate, an exposure/drawing process and a developing process are carried out using the substrate from which the resist stuck to the sides and backside of the substrate is removed, to form a resist pattern.