Position detection apparatus and exposure apparatus
AssigneeCanon Kabushiki Kaisha
InventorSHOSHI KATAYAMA
Life of this patent
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Abstract
An exposure apparatus includes an image sensing section and image sensing control section for measuring the average position of a mark formed on a wafer during a predetermined observation period before a stage completely stops, an interferometer for measuring any deviation of the stage during the observation period, a stage deviation storage section for storing the measurement result by the interferometer in a memory and calculating the average deviation of the stage on the basis of the measurement result, and a shift amount calculation section for calculating the actual position of the mark, while the stage is at rest, on the basis of the average position of the mark and the average deviation of the stage.
Claims25
A detection apparatus (ST) for detecting a position of a mark (WAMX, WAMY) formed on an object (WF) placed on a stage, comprising:
- an image sensing system (MCX, MCY) averaging an image signal obtained by sensing an image of the mark (WAMX, WAMY) formed on the object (WF);
- a measurement system obtaining average data (dx, dy) of a position deviation of the stage;
- and
- an arithmetic section calculating the position (MCX−dx, MCY−dy) of the mark at a state that the stage is at rest on the basis of image data average by said image sensing system and a measurement result (dx, dy) by said measurement system.
An exposure apparatus comprising:
- a stage moving a substrate (WF) placed on a stage;
- a projecting lens (LN) projecting a pattern onto the substrate (WF);
- first measurement means for measuring a position (MCX, MCY) of a mark (WAMX, WAMY) formed on the substrate (WF) on the basis of an average image signal of the mark;
- second measurement means for measuring an average deviation (dx, dy) of said stage;
- calculation means for calculating the position (MCX−dx, MCY−dy) of the mark at a state that said stage is at rest on the basis of a measurement result (MCX, MCY) by said first measurement means and a measurement result (dx, dy) by said second measurement means;
- and
- positioning means for driving said stage on the basis of a calculation result by said calculation means to position the substrate (WF) at a target position.
A detection method of detecting a position of a mark (WAMX, WAMY) formed on an object (WF) placed on a stage, comprising:
- the first measurement step of measuring a position (MCX, MCY) of a mark (WAMX, WAMY) formed on the object (WF) on the basis of an average image signal of the mark;
- the second measurement step of measuring an average deviation (dx, dy) of the stage;
- and
- the calculation step of calculating the position (MCX−dx, MCY−dy) of the mark at a state that the stage is at rest on the basis of a measurement result (MCX, MCY) in the first measurement step and a measurement result (dx, dy) in the second measurement step.
A method of controlling an exposure apparatus having a stage for moving a substrate (WF) placed on a stage, and a projecting lens (LN) for protecting a pattern onto the substrate (WF), comprising:
- the first measurement step of measuring a position (MCX, MCY) of a mark (WAMX, WAMY) formed on the substrate (WF) on the basis of an average image signal of the mark;
- the second measurement step of measuring an average deviation (dx, dy) of the stage;
- the calculation step of calculating the position (MCX−dx, MCY−dy) of the mark at a state that the stage is on the basis of a measurement result (MCX, MCY) in the first measurement step and a measurement result (dx, dy) in the second measurement step;
- and
- the positioning step of driving said stage on the basis of a calculation result in the calculation step to position the substrate (WF) at a target position.
Dependencies are inferred from the claim text.