Resist pattern for alignment measurement
OwnerHiroyuki Yusa, Azusa Yanagisawa +2inventors
InventorsHiroyuki Yusa, Azusa Yanagisawa, Toshifumi Kikuchi, Akihiro Makiuchi
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Abstract
A resist pattern for alignment measurement being shrunk by a heat flow comprises a plurality of positive type or negative type line patterns. Widths of spaces between the line patters are greater than twice those of the line patterns. Alternatively, the resist pattern comprises a box-shaped or slit-shaped measurement pattern and a pair of box-shaped or slit-shaped auxiliary patterns provided inside and outside the measurement pattern, respectively.
Claims11
A resist pattern for alignment measurement, said resist pattern being shrunk by a heat flow, comprising:
- a plurality of line patterns.
A resist pattern for alignment measurement, said resist pattern being shrunk by a heat flow, comprising:
- a measurement pattern;
- and
- a pair of auxiliary patterns provided inside and outside said measurement pattern, respectively.
A resist pattern for alignment measurement, said resist pattern being shrunk by a heat flow, comprising
- a measurement pattern;
- and
- at least one auxiliary pattern provided inside or outside said measurement pattern, wherein widths of spaces between said measurement and auxiliary pattern are equal in vertical and horizontal directions.
A resist pattern for alignment measurement, said resist pattern being shrunk by a heat flow, comprising
- a box-shaped measurement pattern;
- and
- an auxiliary pattern provided outside said measurement pattern, wherein widths of spaces between internal edges of said measurement pattern in vertical and horizontal directions and widths of spaces between outer edges of said measurement pattern and inner edges of said auxiliary pattern in vertical and horizontal directions are all equal.
Dependencies are inferred from the claim text.