Apparatus for etching or depositing a desired profile onto a surface

An apparatus for etching or depositing a desired profile onto a surface of an associated object, comprising:

• a mechanism for delivering of liquid etchant/deposition solution to an applicator,
• said mechanism including a member having an opening selected from the group consisting of an orifice and a slit,
• said applicator being configured for contacting a surface of such an associated object with said solution, with a desired geometry, such that a free-surface flow of liquid solution exits around a periphery of a wetted zone on such an associated object,
• means for inducing a surface tension gradient (Marangoni Effect) in a menicus region of a three-phase contact line where the liquid solution attaches to such an associated object being processed,
• a motion stage for controlled motion of the wetted zone relative to the surface of such an associated object being processed,
• an imaging device and image processing algorithum to calculate topography of such an associated object being processed in real time as such an associated object is in motion relative to said applicator, and
• a computer-control system that uses the calculations from this metrology to control the motion of the stage.