Method of generating large scale signal paths in a parallel processing system
AssigneeHyperchip Inc.
InventorsYvon Savaria, Meng Lu, Claude Thibeault
Life of this patent
Estimating the term…
Abstract
A reticle and method simultaneously generate small- and large-scale circuit structures of a parallel processing system. The reticle includes at least two circuit traces having respective contact pads within an overlap zone of the reticle. Connectivity between a circuit trace of one reticle image with a circuit trace of an adjacent reticle image is controlled by varying the degree of overlap between the two images.
Claims12
A reticle for generating large scale circuit structures on a substrate, the reticle comprising at least two circuit traces defining respective alternative portions of the large-scale circuit structure, each circuit trace having a respective contact pad disposed at a predetermined distance from an edge of the reticle, such that a connectivity between circuit structures generated by a first image of the reticle and circuit structures generated by a second image of the reticle is determined by a degree of overlap between the first and second images.
A reticle for generating large-scale circuit structures on a substrate, the reticle comprising:
- an unconditional circuit trace having a respective contact pad proximal an edge of the reticle, such that a respective circuit structure generated by the unconditional circuit trace is connected to a corresponding circuit structure generated by an adjoining reticle image, substantially independently of a degree of overlap between the two reticle images;
- and
- an optional circuit trace having a respective contact pad disposed at a predetermined distance from an edge of the reticle image, such that a connectivity between a respective circuit structure generated by the optional circuit trace and a corresponding circuit structure generated by an adjoining reticle image is dependent on a degree of overlap between the two reticle images.
A method of generating large scale circuit structures on a substrate, the method comprising steps of:
- providing a reticle comprising at least two circuit traces defining respective alternative portions of the large-scale circuit structure, each circuit trace having a respective contact pad disposed at a predetermined distance from an edge of the reticle;
- and
- controlling a connectivity between circuit structures generated by a first image of the reticle and circuit structures generated by a second image of the reticle by varying a degree of overlap between the first and second images.
Dependencies are inferred from the claim text.