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AssigneeNumerical Technologies, Inc.
InventorsHua-Yu Liu, Chi-Ming Tsai, Yao-Ting Wang
Estimating the term…
A method and system of determining a sensitivity of an edge of a feature to mask error can be advantageously provided using information from multiple simulations. Input data as well as revised data regarding the edge can be used, wherein the revised data includes a first mask error. The input data can be simulated to generate first deviation information, whereas the revised data can be simulated to generate second deviation information accounting for the first mask error. The sensitivity of the edge to mask error can be generated using the first deviation information, the second deviation information, and the first mask error. Specifically, generating the sensitivity can include subtracting the first deviation information from the second deviation and dividing the difference by the first mask error.
A method of determining a sensitivity of an edge to mask error, the edge forming part of a feature, the method comprising:
A system of determining a sensitivity of an edge to mask error, the edge forming part of a feature, the system comprising:
An input file to an inspection system, the input file including:
A computer program product comprising:
A method of inspecting a mask including a plurality of features, the method comprising:
A method of inspecting a wafer including a plurality of features, the method comprising:
Dependencies are inferred from the claim text.