Semiconductor cleaning system and method of controlling the operation of the same

A semiconductor cleaning system, comprising:

• at least one deionized water cleaning unit;
• a source of deionized water for removing particles and chemicals from a wafer surface, said source of deionized water being connected to said at least one deionized water unit so as to supply said at least one deionized cleaning unit with deionized water;
• a first chemical cleaning unit disposed downstream of a said deionized water cleaning unit in the system;
• a first source of chemicals capable of removing organic materials from the wafer surface, said first source of chemicals being connected to said first chemical cleaning unit so as to supply said first chemical cleaning unit with said first chemicals;
• a second chemical cleaning unit disposed downstream of a said deionized water cleaning unit in the system;
• a second source of chemicals capable of removing oxides from the wafer surface, said second source of chemicals being connected to said second chemical cleaning unit so as to supply said second chemical cleaning unit with said second chemicals;
• a first detection unit including at least one detector operative to detect a state in which chemicals are being supplied from said first source of chemicals to said first chemical cleaning unit;
• a second detection unit including at least one detector operative to detect a state in which chemicals are being supplied from said second source of chemicals to said second chemical cleaning unit;
• a control unit operatively connected to said first and second detection units so as to receive data therefrom indicative of whether chemicals are being supplied from said sources of chemicals to said chemical cleaning unit in a manner suitable for a standard chemical cleaning process to occur in said chemical cleaning units, said control unit issuing a control signal when the data indicates that the chemicals are not being supplied in said manner from said source of chemicals to said chemical cleaning units;
• and
• an alarm operatively connected to said control unit so as to be actuated when the control signal is issued by said control unit.

A method of controlling the operation of a semiconductor cleaning system, the method comprising:

• cleaning a wafer, which has been processed, using deionized water;
• subsequently introducing the wafer into a chemical cleaning unit connected to a source of chemicals by a chemical supply pipe;
• once the wafer is disposed in the chemical cleaning unit, detecting whether chemicals are flowing through the chemical supply pipe and detecting the pressure of the chemicals in the chemical supply pipe;
• and
• providing a control protocol under which a control signal is issued when the chemicals are not detected to be flowing through the chemical supply pipe, and the control signal is issued when the pressure of the chemicals in the supply pipe increases beyond a first pressure;
• interlocking the semiconductor device cleaning system when the control signal is issued;
• and
• cleaning the wafer in the chemical cleaning unit when the chemicals are detected to be flowing through the chemical supply pipe and the pressure of the chemicals in the supply pipe remains below the first pressure.