System and method for selective deposition of precursor material
AssigneePrimaxx, Inc.
InventorRobert W. Grant
Life of this patent
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Abstract
A method for selective deposition of integrated circuit thin film, the method comprising: providing a substrate having a surface in a deposition chamber; depositing a photosensitive film on the substrate surface; selectively exposing a portion of the film to UVL (ultraviolet light), thereby creating an exposed film portion and an unexposed film portion; providing, in the deposition chamber, a mist of liquid precursor particles having a first polarity; and utilizing the first polarity to migrate the mist particles to one of either the exposed film portion or the unexposed film portion.
Claims19
A method for selective deposition of precursor material, the method comprising:
- providing a substrate having a surface in a deposition chamber;
- depositing a photosensitive film on the substrate surface;
- selectively exposing a portion of said film to UVL (ultraviolet light), thereby creating an exposed film portion and an unexposed film portion;
- providing, in said deposition chamber, a mist of liquid precursor particles having a first polarity;
- and
- utilizing said first polarity to migrate said mist particles to either said exposed film portion or said unexposed film portion to form a precursor film.
Dependencies are inferred from the claim text.