Scanning projection exposure apparatus and aligning method therefor

A scanning projection exposure apparatus which has a first movable stage which moves with a first object being placed thereon, and a second movable stage which moves with a second object being placed thereon, scans said first and second movable stages in synchronism with each other with respect to a projection optical system, and projects a pattern formed on the first object onto the second object through said projection optical system, comprising

• a reference plate fixed to said first movable stage and having a mark,
• a first detection system for detecting a position of the mark formed on said reference plate, and
• a second detection system for detecting a position of a mark formed on the first object,
• wherein a deformation amount of the first object is obtained on the basis of the position of the mark formed on said reference plate and detected by said first detection system and the position of the mark formed on the first object and detected by said second detection system.

A device manufacturing method of manufacturing a device, comprising the steps of

• coating a substrate with a resist,
• drawing a pattern on the substrate by using a scanning exposure apparatus having a first movable stage which moves with a first object being placed thereon, and a second movable stage which moves with a second object being placed thereon, the scanning exposure apparatus scanning the first and second movable stages in synchronism with each other with respect to a projection optical system, and projecting a pattern formed on the first object onto the second object through the projection optical system, and
• developing the substrate,
• the scanning exposure apparatus including
• a reference plate fixed to the first movable stage and having a mark, and
• a detection system for detecting a position of the mark formed on the reference plate and a position of a mark formed on the first object,
• wherein a deformation amount of the first object is obtained on the basis of the position of the mark formed on the reference plate and the position of the mark formed on the first object, which are detected by the detection system.

A device manufacturing method of manufacturing a device, comprising the steps of

• coating a substrate with a resist,
• drawing a pattern on the substrate by using a scanning exposure apparatus having a first movable stage which moves with a first object being placed thereon, and a second movable stage which moves with a second object being placed thereon, the scanning exposure apparatus scanning the first and second movable stages in synchronism with each other with respect to a projection optical system, and projecting a pattern formed on the first object onto the second object through the projection optical system, and
• developing the substrate,
• alignment of the substrate in the scanning exposure apparatus comprising the steps of
• positioning the first object with respect to the first movable stage, and
• detecting a position of a mark formed on a reference plate fixed to the first movable stage by a detection system and obtaining a detection reference position of the detection system from a position detection result,
• wherein a deformation amount of the first object is obtained in the step of detecting a position of a mark formed on the first object with the detection system.