Facilitating minimum spacing and/or width control during optical proximity correction

A computer-readable storage medium storing instructions that when executed by a computer cause the computer to perform a method that facilitates one or more of minimum spacing and width control during an optical proximity correction operation for a mask that is used in manufacturing an integrated circuit, the method comprising:

• considering a target edge of a first feature on the mask;
• identifying a set of interacting edges in proximity to the target edge;
• and
• performing the optical proximity correction operation, wherein performing the optical proximity correction operation involves applying a first edge bias to the target edge to compensate for optical effects in a resulting image of the target edge;
• wherein applying the first edge bias to the target edge involves allocating an available bias between the first edge bias for the target edge and a second edge bias for at least one edge in the set of interacting edges.

An apparatus that facilitates minimum spacing or width control during an optical proximity correction operation for a mask that is used in manufacturing an integrated circuit, the apparatus comprising:

• an identification mechanism that is configured to identify a set of interacting edges in proximity to a target edge of a first feature;
• and
• an optical proximity correction mechanism that is configured to perform the optical proximity correction operation, wherein the optical proximity correction mechanism is configured to add a first edge bias to the target edge to compensate for optical effects in a resulting image of the target edge;
• wherein the optical proximity correction mechanism is configured to allocate an available bias between the first edge bias for the target edge and a second edge bias for at least one edge in the set of interacting edges.

A means for facilitating minimum spacing or width control during an optical proximity correction operation for a mask that is used in manufacturing an integrated circuit, comprising:

• an identification means that is configured to identify a set of interacting edges in proximity to the target edge of a first feature;
• and
• an optical proximity correction means for performing the optical proximity correction operation, wherein performing the optical proximity correction operation involves applying a first edge bias to the target edge to compensate for optical effects in a resulting image of the target edge;
• wherein while applying the first edge bias to the target edge, the optical proximity correction means is configured to allocate an available bias between the first edge bias for the target edge and a second edge bias for at least one edge in the set of interacting edges.

A method of manufacturing an integrated circuit product that facilitates minimum spacing or width control during an optical proximity correction operation for a mask used in manufacturing the integrated circuit, the method comprising:

• considering a target edge of a first feature on the mask;
• identifying a set of interacting edges in proximity to the target edge;
• and
• performing the optical proximity correction operation, wherein performing the optical proximity correction operation involves applying a first edge bias to the target edge to compensate for optical effects in a resulting image of the target edge;
• wherein applying the first edge bias to the target edge involves allocating an available bias between the first edge bias for the target edge and a second edge bias for at least one edge in the set of interacting edges.

A mask used in fabricating an integrated circuit, wherein the mask is created through a method that facilitates minimum spacing or width control during an optical an proximity correction operation for the mask, the method comprising:

• considering a target edge of a first feature on the mask;
• identifying a set of interacting edges in proximity to the target edge;
• and
• performing the optical proximity correction operation, wherein performing the optical proximity correction operation involves applying a first edge bias to the target edge to compensate for optical effects in a resulting image of the target edge;
• wherein applying the first edge bias to the target edge involves allocating an available bias between the first edge bias for the target edge and a second edge bias for at least one edge in the set of interacting edges.