Apparatus for developing substrate
AssigneeDainippon Screen Mfg. Co., Ltd.
InventorsMasakazu Sanada, Masahiko Harumoto
Life of this patent
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Abstract
A developer supply nozzle moves from a first end toward a second end of a substrate for supplying a developer to the overall main surface of the substrate. After a lapse of a required developing time, a rinse discharge nozzle moves from the first end toward the second end of the substrate for supplying a rinse to the overall main surface of the substrate. A partition plate is provided for preventing the rinse discharged from a slit discharge port of the rinse discharge nozzle onto the substrate from flowing frontward in the direction of movement of the rinse discharge nozzle or washing away the developer supplied onto the substrate frontward.
Claims14
A developing apparatus comprising:
- a substrate holding element substantially horizontally holding a substrate;
- a developer supply element having a slitlike first discharge port discharging a developer for relatively moving in a first horizontal direction with respect to said substrate and discharging said developer onto said substrate from said first discharge port thereby obtaining a puddle of developer covering the overall upper surface of said substrate;
- a rinse supply element having a slitlike second discharge port discharging a rinse for relatively moving in said first horizontal direction with respect to said substrate and discharging said rinse onto said substrate from said second discharge port thereby stopping development with said puddle of developer;
- and
- an anti-flow element preventing:
- i) a first stream of said rinse, discharged onto said substrate from said second discharge port, flowing frontward in said first horizontal direction, and
- ii) a second stream formed by said puddle of developer washed away by said rinse frontward in said first horizontal direction.
An apparatus supplying a second liquid to a puddle of a first liquid covering the upper surface of a substantially horizontally held substrate, comprising:
- a second liquid supply head supplying said second liquid to said puddle while scanning said puddle;
- and
- a blocking device intermittently inserted into said puddle in synchronization with scanning of said second liquid supply head for blocking movement of said puddle resulting from arrival of said second liquid on said puddle.
An apparatus supplying a second liquid to a puddle of a first liquid covering the upper surface of a substantially horizontally held substrate, comprising:
- a second liquid supply head supplying said second liquid to said puddle causing distortion due to arrival of said second liquid on said puddle;
- and
- a drive mechanism making said second liquid supply head supplying said second liquid horizontally scan said substrate along said upper surface of said substrate by supplying such a scanning rate that said distortion of said puddle cannot overtake said scanning of said second liquid supply head.
Dependencies are inferred from the claim text.