Device manufacturing-related apparatus, gas purge method, and device manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorTakashi Kamono
Life of this patent
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Abstract
A reticle (23) with a pellicle is movably set on a reticle support table (28). An inert gas supply portion (29) and inert gas exhaust portion (37) are so driven as to sandwich a pellicle frame (25), and align the pellicle frame (25). The inert gas supply portion (29) and inert gas exhaust portion (37) are brought into tight contact with the pellicle frame (25). In this state, inert gas is supplied from the inert gas supply portion (29) into the pellicle space via a vent hole (27) of the pellicle frame (25). Inert gas is exhausted to the inert gas exhaust portion (37) via a vent hole (27) formed on the opposite side.
Claims26
A device manufacturing-related apparatus having a space for storing a reticle with a pellicle whose pellicle film is supported by a pellicle frame, the apparatus comprising an alignment mechanism arranged to align the pellicle frame at a predetermined position.
A gas purge method of purging, with inert gas via a vent hole formed in a pellicle frame, gas in a pellicle space serving as a space within the pellicle frame of a reticle with a pellicle whose pellicle film is supported by the pellicle frame, the method comprising the steps of:
- aligning the pellicle frame at a predetermined position;
- and
- supplying inert gas from an inert gas supply portion into the pellicle space via the vent hole while the inert gas supply portion is in tight contact with the pellicle frame.
Dependencies are inferred from the claim text.