Apparatus and method for contact hole exposure
AssigneeNanya Technology Corporation
InventorYuan-Hsun Wu
Life of this patent
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Abstract
Apparatus and method for contact hole exposure. First, an exposure apparatus including a light source and a lens comprising a central transparent area and at least one dummy transparent area is provided. Next, a mask having a plurality of contact hole patterns is provided. Finally, exposure is performed to transmit light from the light source through the mask. Additionally, the exposure apparatus comprises a light source producing light and a lens having a central transparent area and at least one dummy transparent area transmitting the light for exposure.
Claims14
An exposure method for contact holes, comprising:
- providing an exposure apparatus including a light source and a lens, wherein the lens comprises a central transparent area and at least one dummy transparent area;
- providing a mask having a plurality of contact hole patterns;
- and
- performing exposure with a light from the light source transmitting through the lens and the mask.
An exposure apparatus, comprising:
- a light source, producing a light;
- and
- a lens, having a central transparent area and at least one dummy transparent area, transmitting the light for exposure.
Dependencies are inferred from the claim text.