Exposure apparatus, substrate processing system, and device meanufacturing method

An exposure apparatus that transfers a pattern formed on a mask onto a substrate via a projection optical system, the exposure apparatus comprising:

• an optical system holding unit that holds the projection optical system;
• a stage chamber where a substrate chamber that houses a substrate stage holding the substrate is formed inside, along with a first opening in which members on an image plane side of the projection optical system can be inserted;
• and
• a first connecting member that connects a periphery portion of the first opening of the stage chamber to a circumferential portion of the projection optical system while isolating the inside of the substrate chamber from outside air in a sealed state, the first connecting member having flexibility.

An exposure apparatus that transfers a pattern formed on a mask onto a substrate via a projection optical system, the exposure apparatus comprising:

• a stage chamber where members on an image plane side of the projection optical system are inserted and a sealed chamber that houses a substrate stage holding the substrate is formed inside;
• a first main body unit that supports the stage chamber by suspension;
• and
• reaction bars that absorb reaction force occurring when the substrate stage is driven, one end of the reaction bar being connected to the stage chamber.

An exposure apparatus that transfers a pattern formed on a mask onto a substrate via a projection optical system, the exposure apparatus comprising:

• a stage chamber where a substrate chamber that houses a substrate stage holding the substrate is formed inside, along with a first opening in which members on an image plane side of the projection optical system can be inserted;
• and
• an optical system holding unit where a second opening is formed at a position opposing the first opening, the optical system holding unit having a holding member for holding the projection optical system;
• a connecting member that connects a periphery portion of the first opening of the stage chamber to the second opening of the holding member;
• a cover that covers a circumferential portion on an object surface side of the projection optical system, one end of the cover being connected to a surface of the holding member opposite to the stage chamber;
• a planar glass mounted on an opening edge surface of the cover via a double-structured O-ring;
• and
• an exhaust pipe that exhausts gas inside a ring-shaped space enclosed by the double structured O-ring, the planar glass, and the cover, the exhaust pipe being connected to the space via the cover.

A substrate processing system that performs a predetermined process on a substrate, the substrate processing system comprising:

• an exposure apparatus comprising an exposure apparatus main body that forms a predetermined pattern on the substrate by exposure, the exposure apparatus main body having a stage chamber that houses a substrate stage holding the substrate and a main unit that detachably supports the stage chamber by suspension, and a total chamber that houses the exposure apparatus main body almost entirely;
• a substrate processor that performs at least one of resist coating and development on the substrate;
• and
• an interface section that connects the total chamber and the substrate processor inline, the interface section being freely detachable to the total chamber and the substrate processor, with a substrate carriage system housed inside.