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US 2003/0115569 A1Published application
Method and system for optical proximity correction
AssigneeKabushiki Kaisha Toshiba
InventorAtsuhiko Ikeuchi
Life of this patent
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Abstract
A computer implemented method for OPC includes: storing an improper OPC pattern and a corrective treatment for the improper OPC pattern in a library storage medium; reading a layout pattern; and matching the layout pattern with the improper OPC pattern stored in the library storage medium.
Claims20
A computer implemented method for OPC comprising:
- storing improper OPC patterns and corrective treatments for the improper OPC patterns in a library storage medium;
- reading a layout pattern;
- and
- matching the layout pattern with one of the improper OPC pattern stored in the library storage medium.
1 more element
An system for OPC comprising:
- a library storage medium;
- a library registration unit configured to store an improper OPC pattern and a corrective treatment for the improper OPC pattern in the library storage medium;
- and
- a pattern matching unit configured to match the layout pattern with the improper OPC pattern stored in the library storage medium.
1 more element
A computer program product for use with an optical proximity correction system, the system comprises a CPU and a library storage medium connected to the CPU, the computer program product comprising:
- instructions configured to store improper OPC patterns and corrective treatments for the improper OPC patterns in a library storage medium;
- instructions configured to read a layout pattern;
- and
- instructions configured to match the layout pattern with one of the improper OPC pattern stored in the library storage medium.
1 more element
Dependencies are inferred from the claim text.