Photoresist stripper compositions
AssigneeSamsung Electronics Co., Ltd.
InventorsSeung-Hyun Ahn, Sang-Mun Chon, Hoe-Sik Chung, Mi-Sook Jeon, Eun-Mi Bae, Baik-Soon Choi, Ok-Seok Jang
Life of this patent
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Abstract
A photoresist stripper composition is made up of a mixture of an acetic acid ester, γ-butyrolactone (GBL), and a non-acetate ester or a poly alkyl alcohol derivative. The acetic acid ester may be at least one of n-butyl acetate, amyl acetate, ethyl aceto-acetate, and isopropyl acetate. The non-acetate ester may be at least one of ethyl lactate (EL), ethyl-3-ethoxy propionate (EEP) and methyl-3-methoxy (MMP). The poly alkyl alcohol derivative may be at least one of propylene glycol monomethyl ester (PGME) and propylene glycol monomethyl ester acetate (PGMEA).
Claims30
A photoresist stripper composition consisting essentially of a mixture of an acetic acid ester, γ-butyrolactone (GBL), and a non-acetate ester.
A photoresist stripper composition consisting essentially of a mixture of an acetic acid ester, γ-butyrolactone (GBL), and an alcohol derivative.
Dependencies are inferred from the claim text.