Negative photosensitive resin composition and display device using the same
OwnerSatoshi Kobayashiinventor
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Abstract
A negative working radiation sensitive resin composition comprising; an alkali-soluble novolak resin treated by fractionation and having 1,000 to 10,000 of weight average molecular weight as determined by polystyrene standard, where the portion with molecular weight of 500 or less is 5% or less in the total weight of the composition; a crosslinking agent; and a photo acid generator. This negative working radiation sensitive resin composition can be used preferably as etching resist, ion implantation resist, plating resist, LCD panel structural material such as spacer and electrode insulation material for an organic EL display because of having wide process margin, high heat resistance, high sensitivity, high resolution and good pattern shape.
Claims2
A negative working radiation sensitive resin composition comprising an alkali-soluble novolak resin, a cross-linking agent, and a photo acid generator, wherein said alkali-soluble novolak resin is one treated by fractionation and has a weight average molecular weight of 1,000 to 10,000 as determined by polystyrene standards and the ratio by weight of the component with molecular weight of below 500 including 500 in the resin is 5% or less in the total weight of the resist composition.
Dependencies are inferred from the claim text.