Apparatus for stripping photoresist and method thereof

An apparatus for removing a photoresist from a substrate which comprises:

• a stripping bath chamber;
• a conveying unit conveying a substrate containing a photoresist through the stripping bath chamber;
• a photoresist stripper material supplying unit positioned to dispense the photoresist stripper material to the substrate while the substrate is disposed in the stripping bath chamber;
• an antifoaming agent supplying unit operatively associated with the stripping bath chamber dispensing an antifoaming agent toward the photoresist stripper material in the stripping bath chamber;
• an antifoaming agent storing unit communicating with the antifoaming agent supplying unit supplying antifoaming agent thereto;
• a stripper storing unit operatively connected to the stripper supplying unit supplying stored photoresist stripper material thereto;
• and
• an additional antifoaming agent supplying unit operatively associated with the stripper storing unit dispensing an antifoaming agent therein.

A method of removing a photoresist from a substrate which comprises:

• providing a stripping bath chamber;
• conveying a substrate containing a photoresist through the stripping bath chamber;
• applying a photoresist stripper material to the substrate containing the photoresist;
• and
• applying an antifoaming agent to the photoresist stripper material to eliminate the foam produced therein.