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AssigneeJapan Pionics Co., Ltd.
InventorsYukichi Takamatsu, Takeo Yoneyama, Mitsuhiro Iwata, Koji Kiriyama, Kiichirou Araya
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There is disclosed a vaporizing and supplying method for controlling a liquid CVD material in flow rate with liquid flow rate controllers, supplying a vaporizer with the material, vaporizing the same, and supplying a semiconductor manufacturing apparatus with the vaporized material, which comprises installing in parallel, a plurality of liquid flow rate controllers, preferably each having a different controllable range of flow rate, and supplying the vaporizer with the material at a variable flow rate thereof by altering the single use of any of the controllers to the simultaneous use of a plurality thereof or vice versa, and/or switching any of the controllers one after another.
A vaporizing and supplying method for subjecting a liquid CVD material to flow rate control with a liquid flow rate controller, supplying a vaporizer with the material, vaporizing the same, and supplying a semiconductor manufacturing apparatus with the vaporized material, which comprises installing in parallel, a plurality of liquid flow rate controllers for the same type of liquid CVD material, and supplying the vaporizer with said material at a variable flow rate thereof by at least one way selected from altering the single use of any of the controllers to the simultaneous use of a plurality thereof or vice versa, and switching any of the controllers one after another.
Dependencies are inferred from the claim text.