Wafer treatment method for protecting fuse box of semiconductor chip
AssigneeSamsung Electronics Co., Ltd.
InventorsJae-Il Lee, Jeong-Ho Bang, Young-Moon Lee, Hyo-Geun Chae
Life of this patent
Estimating the term…
Abstract
Methods for treating a wafer to protect a fuse box of a semiconductor chip are provided. These methods include applying an insulating coating solution onto the surface of at least one of a plurality of fuse boxes in a semiconductor chip so as to prevent moisture or impurities from seeping into the fuse box. With these methods, the degradation of the semiconductor chip can be substantially reduced by protecting the fuse box from a high-temperature and very humid atmosphere, and impurities such as particles. Thus, characteristics and reliability of the semiconductor chip can be also improved.
Claims13
A method of treating a wafer, the method comprising:
- applying an insulating coating solution onto a surface of at least one of a plurality of fuse boxes in a semiconductor chip so as to prevent moisture or impurities from entering into the fuse box.
A semiconductor chip, comprising:
- a substrate;
- a blocking layer formed on the substrate;
- a fuse formed on the substrate, wherein the blocking layer has an opening that exposes the fuse therethrough;
- and
- an insulating layer that covers the exposed fuse, the insulating layer being formed by applying an insulating coating solution on the exposed fuse.
Dependencies are inferred from the claim text.