Method for controlling field flow decouple plating and a device thereof
OwnerShyh Biau Jiang, Dong Liang Lee +3inventors
InventorsShyh Biau Jiang, Dong Liang Lee, Chi Ming Yang, Hsin Ming, Chuan Fu Huang
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OwnerShyh Biau Jiang, Dong Liang Lee +3inventors
InventorsShyh Biau Jiang, Dong Liang Lee, Chi Ming Yang, Hsin Ming, Chuan Fu Huang
Estimating the term…
A method for controlling plating with two independent power sources, wherein the high voltage power source is used for controlling the electrical swimming speed of the metal positive ions while the other is low-voltage power source for being used to control rate of plating rate. Positively charged metal ions of the strong electric field in the plating solution can reach to the negatively charged and unevenly distributed surface of the extraction negative pole more quickly, which is in turn connected to the negative of the low voltage power source. The ions aggregate at the recess of the extraction negative pole surface and waiting incoming electrons so as to perform electric extraction and produce uniform plating. The present invention also provides the apparatus for carrying out the mentioned method and therefore achieves better plating quality.
A method for controlling field flow decouple plating, comprising following steps:
An apparatus of field flow decouple plating, comprising:
Dependencies are inferred from the claim text.