Exposure apparatus and method

An apparatus for projecting a pattern, comprising:

• a light source for emitting a laser;
• a coherence decreasing unit for decreasing coherence of the laser emitted from the light source;
• an illuminating unit which illuminates a mask on which a pattern is formed with the laser emitted from the light source and which is decreased in coherence by the decreasing unit;
• a holder which holds the mask;
• an optical lens unit which projects the pattern formed on the mask onto a surface of a substrate by the laser illuminated on the mask;
• and
• a table which mounts the substrate and moves in at least one direction.

A method for projecting a pattern, comprising the steps of:

• emitting a laser from a light source;
• decreasing coherence of the laser;
• shaping the laser in a particular shape;
• illuminating a mask on which a pattern is formed with the laser which coherence is decreased and shaped in the particular shape;
• and
• forming a light pattern on a substrate by the laser illuminated and passed through the mask.

A method for projecting a pattern, comprising the steps of:

• emitting a laser from a light source;
• forming the laser in a particular shape;
• illuminating a mask on which a pattern is formed with the laser formed in the particular shape;
• and
• projecting a light pattern on a substrate by the laser illuminated and passed through the mask.