Method for improved lithographic patterning utilizing multiple coherency optimized exposures and high transmission attenuated PSM

A computer program product for controlling a computer comprising a recording medium readable by the computer, means recorded on the recording medium for directing the computer to control an optical exposure tool for optically transferring a lithographic pattern corresponding to an integrated circuit utilizing a high transmission attenuated phase-shift mask onto a semiconductor substrate by use of an optical exposure tool, the transfer method comprising the steps of

• generating a diffraction pattern corresponding to said lithographic pattern, said diffraction pattern indicating a plurality of spatial frequency components corresponding to said lithographic pattern;
• determining which of said spatial frequency components need to be captured by a lens in said optical exposure tool in order to accurately reproduce said lithographic pattern;
• determining a set of illumination conditions required for said optical exposure tool to capture said spatial frequency components necessary for accurately reproducing said lithographic pattern;
• and
• illuminating said a high transmission attenuated phase-shift mask with said set of said illumination conditions.

A device manufacturing method comprising the steps of:

• generating a diffraction pattern corresponding to a lithographic pattern, said diffraction pattern indicating a plurality of spatial frequency components corresponding to said lithographic pattern;
• determining which of said spatial frequency components need to be captured by a lens by a lens in an optical exposure tool in order to accurately reproduce said lithographic pattern on a substrate;
• determining a set of illumination conditions required for said optical exposure tool to capture said spatial frequency components necessary for accurately reproducing said lithographic pattern;
• and
• illuminating a high transmission attenuated phase-shift mask with said set of said illumination conditions.

A method for generating a mask, said method comprising the steps of:

• generating a diffraction pattern corresponding to a lithographic pattern to be imaged, said diffraction pattern indicating a plurality of spatial frequency components corresponding to said lithographic pattern;
• determining which of said spatial frequency components need to be captured by a lens in an optical exposure tool in order to accurately reproduce said lithographic pattern;
• and
• forming a reticle having a pattern which allows said spatial frequency components to be captured to be imaged on a substrate.

A computer program product for controlling a computer comprising a recording medium readable by the computer, means recorded on the recording medium for directing the computer to generate files corresponding to a mask utilized in the process of optically transferring a lithographic pattern corresponding to an integrated circuit onto a semiconductor substrate by use of an optical exposure tool, the transfer method comprising the steps of:

• generating a diffraction pattern corresponding to a lithographic pattern to be imaged, said diffraction pattern indicating a plurality of spatial frequency components corresponding to said lithographic pattern;
• determining which of said spatial frequency components need to be captured by a lens in an optical exposure tool in order to accurately reproduce said lithographic pattern;
• and
• forming a reticle having a pattern which allows said spatial frequency components to be captured to be imaged on a substrate.