Exposure apparatus
AssigneeCanon Kabushiki Kaisha
InventorsYoshikazu Miyajima, Hideki Nogawa
Life of this patent
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Abstract
An object of this invention is to prevent a decrease in purge pressure in exposure and an increase in oxygen concentration caused by a purge error near the periphery of a wafer or reticle. To achieve this object, an exposure apparatus includes a movable stage, a chuck device which is arranged on the stage and holds a substrate, a first gas supply device for supplying gas to a position of the substrate to be exposed, and a plurality of divided planar members which are arranged adjacent to the periphery of the substrate, and are flush with or almost flush with the surface of the substrate.
Claims19
An exposure apparatus comprising:
- a movable stage;
- a chuck device which is arranged on said stage and holds a substrate;
- a first gas supply device for supplying gas to a position of the substrate to be exposed;
- and
- a plurality of divided planar members which are arranged adjacent to a periphery of the substrate, and are flush with or substantially flush with a surface of the substrate.
An exposure apparatus comprising:
- a movable stage;
- a chuck device which is arranged on said stage and holds a substrate;
- a gas supply device for supplying gas to a position of the substrate to be exposed;
- and
- a planar member which is arranged adjacent to a periphery of the substrate, is flush with or substantially flush with a surface of the substrate, and is integrated with said chuck device.
Dependencies are inferred from the claim text.