Chemical mechanical polishing
OwnerChou H. Liinventor
Life of this patent
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Abstract
Polishing compositions and tools for achieving polishing
Claims25
CMP equipment of the type having a platform moving relative to a material to be polished;
- said platform comprising a platform substrate;
- solid abrasive particles introduced onto said substrate;
- and
- means for preventing tiny, hard but brittle working edges and points on said solid abrasive particles from sufficiently contacting and damaging each other to thereby significantly lengthen the useful life of the of said solid abrasive particles.
The CMP equipment as in claim 17 in which said diamond particles are transparent to a laser heating beam which transmits through the bulk of the diamond particles without much energy exchange and with little change of the tiny, hard but brittle working edges and points;
- said laser heating beam predominantly heating up the laser-opaque diamond-substrate interfacial bonding regions to cause said fusion bonding to take place at the interfacial bonding regions.
Equipment for handling a plurality of delicate solid objects, comprising:
- a common liquid container;
- a liquid suspension medium contained in said common liquid container;
- a plurality of delicate solid objects suspended in said liquid suspension medium contained in said common liquid container;
- and
- means for preventing the plurality of said delicate solid objects in said liquid suspension medium contained in said common liquid container from sufficiently contacting and damaging each other to thereby significantly preserve at least a desired quality of the plurality of said delicate solid objects.
A planarizing equipment for planarizing an outer surface of a material comprising:
- a planarizing platform relatively moving with respect to said material to be planarized;
- mean for holding and mounting the material against the relatively moving plarform with the outer surface of the material facing against a surface of said moving platform;
- a liquid suspension supplied between said material and said relatively moving platform;
- said liquid suspension comprising a liquid suspension medium of a specific liquid density and a plurality of solid abrasive particles of a substantially constant solid density, for planarizing the outer surface of the material;
- the specific liquid density being selected to be sufficiently within 15% of the substantially constant solid density whereby at least a majority of the plurality of said solid abrasive particles are freely and stably suspended in the liquid suspension medium without gravitational settling and separation thereby minimizing damaging contact of the solid abrasive particles and prolonging life of said abrasive liquid suspension.
24 Equipment for handling a plurality of delicate solid objects comprising:
- a liquid container having a bottom and enclosing side wall means, said container bottom having a top major surface;
- a liquid suspension medium placed on said top major surface inside said liquid container;
- a plurality of delicate solid objects suspended in said liquid suspension medium from sufficiently contacting and damaging each other to thereby significantly preserve at least a desired quality o fteh plurality of said delicate solid objects.
The equipment according to claim 24 in which said delicate solid objects are selected from the group consisting of solid abrasive particles, knives, tool bits, jewelry, watches, delicate parts sensitive components, fragile materials, solid objects with delicate features to be protected and preserved.
Dependencies are inferred from the claim text.