Method and apparatus for forming multi-layered thin film by using photolysis chemical vapor deposition

A method for forming a multi-layered thin film, comprising:

• preparing a substrate;
• forming an atmosphere comprising a plurality of source gases over the substrate;
• alternatingly emitting for a predetermined time each of a plurality of reaction lights having different wavelengths on the substrate and the plurality of source gases;
• and
• alternatingly heating and cooling for a predetermined time the substrate at a predetermined temperature.

A photolysis chemical vapor deposition (PCVD) reactor comprising:

• a chamber having a support for placing a substrate thereon;
• a gas supply system for supplying a plurality of source gases to the substrate in the chamber;
• and
• a light supply system mounted at one side of the chamber and selectively emitting one of the plurality of reaction lights having different wavelengths on the substrate.

A photolysis chemical vapor deposition (PCVD) reactor comprising:

• a chamber having a substrate support;
• a gas supply system configured to supply at least two source gases into the chamber;
• and
• a light source supply system mounted at one side of the chamber and having one light source adapted to emit reaction lights on the substrate.