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US 2002/0172901 A1Published application
Method of exposing a lattice pattern onto a photo-resist film
AssigneeNEC Corporation
InventorMasatoshi Tokushima
Life of this patent
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Abstract
The present invention provides a method of optical exposure to form a lattice pattern on a photo-resist, wherein at least two times of multiple exposure are carried out by use of different patterns.
Claims13
A method of optical exposure to form a lattice pattern on a photo-resist, wherein at least two times of multiple exposure are carried out by use of different patterns.
Dependencies are inferred from the claim text.