Antireflective coating compositions
AssigneeShipley Company, L.L.C.
InventorsTimothy G. Adams, Edward K. Pavelchek, Roger F. Sinta, Manuel DoCanto, Robert F. Blacksmith, Peter Trefonas III
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Abstract
The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly suitable for short wavelength imaging applications such as 193 nm. The ARCs of the invention are preferably used with an overcoated resist layer (i.e. bottom layer ARCs) and in general comprise novel ARC resin binders that can effectively absorb reflected sub-200 nm exposure radiation.
Claims22
A method for forming a photoresist relief image comprising:
- (a) applying on a substrate a layer of an antireflective composition that comprises a resin binder that has phenyl groups;
- (b) curing the antireflective composition layer;
- (c) applying a layer of a photoresist composition over the antireflective composition layer;
- (d) exposing the photoresist layer to activating radiation and developing the exposed photoresist layer.
A method for forming a photoresist relief image comprising:
- (a) applying on a substrate a layer of an antireflective composition that comprises a resin binder that has phenyl groups;
- (b) applying a layer of a photoresist composition over the antireflective composition layer;
- (c) exposing the photoresist layer to activating radiation and developing the exposed photoresist layer.
A coated substrate comprising:
- a coated substrate having thereon
- 1) a coating layer of an antireflective composition that comprises a resin that has phenyl groups;
- and
- 2) a coating layer of a photoresist over the antireflective composition layer.
A bottom-layer antireflective composition for use with imaging an overcoated photoresist at sub-200 nm wavelengths, comprising a resin that has phenyl groups.
Dependencies are inferred from the claim text.