Method of use for reusable monitor wafer
OwnerChing-Yu Changinventor
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Abstract
A method of use for a reusable monitor wafer, having multiple crystal original pits (COP) on its surface, used for monitoring and measuring particle amounts in a chemical vapor deposition (CVD) process. First, a silicon oxide layer is formed on the surface of a monitor wafer. A first cleaning process and a thin film deposition process, forming a thin film layer on a surface of the silicon oxide layer, are then performed, respectively. Thereafter, a particle measurement process is performed to measure particle amounts on the surface of the thin film layer. After removing the thin film layer and the silicon oxide layer on the monitor wafer, respectively, a second cleaning process is performed.
Claims10
A method of use for a reusable monitor wafer, the monitor wafer used for monitoring and measuring particle amounts in a thin film deposition process, the method comprising:
- forming a silicon oxide layer on a surface of the monitor wafer;
- performing a first cleaning process;
- performing a thin film deposition process to form a thin film layer on a surface of the silicon oxide layer;
- performing a particle measurement process to measure particle amounts on the surface of the thin film layer;
- removing the thin film layer on the monitor wafer;
- removing the silicon oxide layer on the surface of the monitor wafer;
- and
- performing a second cleaning process.
Dependencies are inferred from the claim text.