Back to results
US 2002/0170822 A1Published application
Sputtering system
AssigneeLG. Philips LCD Co., Ltd.
InventorSoo Chang Chang
Life of this patent
Estimating the term…
Abstract
A sputtering system for depositing a thin film on a substrate includes a vacuum chamber, a support for supporting the substrate in the vacuum chamber, a target arranged to oppose the support, a fixed plate formed on a first side of the target, and a plurality of electromagnets formed on the fixed plate in a cell pattern.
Claims8
A sputtering system for depositing a thin film on a substrate, comprising:
- a vacuum chamber;
- a support for supporting the substrate in the vacuum chamber;
- a target arranged to oppose the support;
- a fixed plate formed on a first side of the target;
- and
- a plurality of electromagnets formed on the fixed plate in a cell pattern.
3 more elements
Dependencies are inferred from the claim text.