Maleimide-photoresist polymers containing fluorine and photoresist compositions comprising the same
AssigneeHynix Semiconductor Inc.
InventorsGeun Su Lee, Jae Chang Jung, Ki Soo Shin
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Abstract
Photoresist polymers, and photoresist compositions using the polymer are disclosed. More specifically, photoresist polymers containing maleimide represented by Formula 1. Photoresist compositions including the photoresist polymers have excellent etching resistance, heat resistance and adhesiveness, and development ability in aqueous tetramethylammonium hydroxide (TMAH) solution. As the compositions have low light absorbance at 193 nm and 157 nm wavelength, they are suitable for a process using ultraviolet light source such as VUV (157 nm). Formula 1 1 wherein, 1, R1, R2, R3, R, R′, R″, R″′, X, a and b are defined in the specification.
Claims19
A photoresist polymer comprising a repeating unit represented by the following Formula 1:
- 5
- wherein, R1 and R2 are individually selected from the group consisting of H, (C1-C10) alkyl and (C1-C10) alkyl comprising ether group(—O—);
- R3 is selected from the group consisting of (C1-C20) alkyl, perfluoroalkyl, partially fluorine-substituted alkyl carboxylate and COOR°;
- R° is an acid labile protecting group;
- R, R′, R″ and R″′ are individually selected from the group consisting of H, F, (C1-C10) perfluoroalkyl, (C1-C10) perfluoroalkyl containing ether group(—O—), partially fluorine-substituted (C1-C10) alkyl and partially fluorine-substituted (C1-C10) alkyl containing ether group(—O—);
- X is selected from the group consisting of CH2, CH2CH2, S and O;
- and the ratio a:b falls within the ranges 10˜90 mol %:90˜10 mol %.
A process for preparing a photoresist polymer comprising:
- (a) admixing (i) a compound of Formula 2 and (ii) a compound of Formula 3 to obtain a mixture;
- (b) adding a polymerization initiator to the mixture to obtain the following Formula 4;
- and
- (c) reacting Formula 4 and following Formula 5 with a base catalyst to obtain a repeating unit of the following Formula 1,
- 7
- wherein, R1 and R2 are individually selected from the group consisting of H, (C1-C10) alkyl and (C1-C10) alkyl comprising ether group(—O—) ;
- R3 is selected from the group consisting of (C1-C20) alkyl, perfluoroalkyl, partially fluorine-substituted alkyl carboxylate and COOR°;
- R° is an acid labile protecting group;
- R, R′, R″ and R″′ are individually selected from the group consisting of H, F, (C1-C10) perfluoroalkyl, (C1-C10) perfluoroalkyl containing ether group(—O—), partially fluorine-substituted (C1-C10) alkyl and partially fluorine-substituted (C1-C10) alkyl containing ether group(—O—);
- X is selected from the group consisting of CH2, CH2CH2, S and O;
- and the ratio a:b falls within the ranges 10˜90 mol %:90˜10 mol %.
Dependencies are inferred from the claim text.