Method of prevention of particle pollution in a pre-clean chamber
AssigneeSilicon Integrated Systems Corp.
InventorsChia-ming Kuo, Chao-yuan Huang
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Abstract
This method of prevention of particle pollution in a pre-clean chamber includes an oxygen gas supplying step for injecting oxygen gas into the pre-clean chamber; and a plasma generating step for ionizing the oxygen gas into plasma so as to interact with silicon-rich oxide to form a silicon oxide layer in the pre-clean chamber. The method according to the invention could prevent particle pollution due to peeling-off of silicon-rich oxide in a pre-clean chamber so as to prolong the life of a bell-jar therein.
Claims4
A method of prevention of particle pollution in a pre-clean chamber, which is used in the pre-clean chamber having silicon-rich oxide, comprising:
- An oxygen gas supplying step for injecting oxygen gas into the pre-clean chamber, and
- A plasma generating step for ionizing the oxygen gas into plasma so as to interact with the silicon-rich oxide to form a silicon oxide layer in the pre-clean chamber.
Dependencies are inferred from the claim text.