Magnetron sputter source with multipart target
AssigneeUnaxis Balzers Aktiengesellschaft
InventorMartin Durs
Life of this patent
Estimating the term…
Abstract
A device and method has a magnetron sputter source with a multipart target (3, 4) and movable magnet system (5). By variation of the power delivery of the power supply (6), specific areas of the multipart target (3, 4) can be preferably affected, which permits setting the stoichiometry of the sputtered-off target materials on the substrate (15) to be covered and positively affecting the homogeneity of the layer structure.
Claims19
A method for operating a magnetron sputter source with a multipart target, a movable magnet system (5) and at least one power supply (6) for plasma generation, comprising the steps of delivering power from at least one power supply (6) that is varied during operation of the magnetron sputter source.
A magnetron sputter source for coating substrates (15) with a multipart target, comprising:
- a movable magnet system (5) with drive for affecting pulverization regions on the target, at least one power supply (6), the power supply (6) comprising further means for modulating power delivery with further means for synchronization with driving of the magnet system.
Dependencies are inferred from the claim text.