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US 2002/0162507 A1Published application
Self-renewing coating for plasma enhanced processing systems
AssigneeApplied Materials, Inc.
InventorQuanyuan Shang
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Abstract
Aspects of the invention generally provide an apparatus and method for providing a contaminate barrier on the surfaces inside the chamber to inhibit the release of contamination within the chamber during processing. In one aspect, the contaminate barrier is self-renewing and may be formed during a process step.
Claims31
An apparatus for substrate deposition, comprising:
- a chamber having a body, a bottom, and a lid;
- a pump to maintain gas pressure within the chamber;
- a substrate support member disposed within the chamber having a substrate supporting surface thereon;
- and
- a self-renewing layer disposed on one or more of the internal surfaces of the chamber and the surface of the support member wherein the layer has a lower rate of evaporation than contaminate compounds produced in the chamber during a processing cycle.
2 more elements
A method of forming a layer of material prior to processing to minimize contamination, comprising:
- delivering a process gas into a chamber;
- and
- depositing a self-renewing layer upon a plurality of surfaces in the chamber, the layer comprising a lower evaporation rate than contaminate compounds therein.
A method of forming a layer of material within a substrate processing chamber to minimize substrate contamination during processing, comprising:
- delivering a process gas into a chamber;
- and
- depositing a self-renewing layer upon a plurality of surfaces in the chamber, the layer comprising an evaporation rate less than contaminate compounds therein, wherein the layer forms a contaminate barrier about 1000 angstroms to 10,000 angstroms thick between the process gas and the surfaces to impede the formation of the contaminate compounds therein.
Dependencies are inferred from the claim text.