Multiple vertical wafer cleaner

An apparatus for cleaning a surface of a workpiece, the apparatus comprising:

• (a) a first set of rollers, the rollers arrayed such that roller surfaces provide support for a workpiece to be cleaned, at least one of the rollers coupled to a drive motor;
• (b) a second set of rollers, the rollers arrayed such that roller surfaces provide support for a workpiece to be cleaned, at least one of the rollers coupled to a drive motor;
• (c) a first tank at least partially surrounding the first set of rollers;
• (d) a second tank at least partially surrounding the second set of rollers;
• (e) a first megasonic transducer contained in the first tank;
• and
• (f) a second megasonic transducer contained in the second tank.

A cleaning apparatus for cleaning surfaces of workpieces, the apparatus comprising:

• (a) a first pair of brushes;
• (b) a second pair of brushes;
• (c) a first support member configured to rotatably support a workpiece so that when a workpiece is placed between the first pair of brushes, the surface of the workpiece is oriented vertically;
• (d) a second support member configured to rotatably support a workpiece so that when a workpiece is placed between the second pair of brushes, the surface of the workpiece is oriented vertically;
• (e) a first drive motor coupled to one of the first pair of brushes;
• (f) a second drive motor coupled to one of the second pair of brushes;
• and
• (g) a controller, the controller coupled to the first and second drive motors, wherein during workpiece cleaning operations the controller is configured to cause the first and second drive motors to rotate the first and second pair of brushes about an axis that is perpendicular to the surfaces of workpieces and to cause the first and second pair of brushes to contact the workpieces.