Loading patent…
OwnerRudolf Wagner, Siegfried Wiltsche +1inventors
InventorsRudolf Wagner, Siegfried Wiltsche, Juergen Ramm
Estimating the term…
A method of manufacturing electronic or opto-electronic or micromechanic components by providing a vacuum where the external surface of a wall is exposed to ambient air and the inner surface enclosed as a processing area. A base body of a part to be manufactured is introduced into the processing area and a low energy plasma discharged is generated in the process area, the ion energy at the surface of the base body is between 0 and 15 eV in order to introduce a reactive gas. Subsequently, the reactive gas treats the base body in order to separate the processing area from an inner surface of the wall and enclosing the processing area during the treatment.
Method for producing coated workpieces of a quality sufficient for epitaxy, characterized in that the workpiece is coated by means of PECVD using a DC discharge.
Use of a PECVD method with DC discharge for producing epitaxy layers.
System according to one of claims 36 to 46, characterized in that, essentially concentrically with respect to the diaphragm axis, a magnet arrangement is provided, for generating a magnetic field in the recipient which is coaxial to the diaphragm axis or is offset thereto, the magnet arrangement comprising permanent magnets and/or at least one coil arrangement.
Use of a PECVD coating method with a DC discharge for the growth of epitaxy layers.
Dependencies are inferred from the claim text.