Modification of mask layout data to improve mask fidelity
AssigneeAdvanced Micro Devices, Inc.
InventorsRamkumar Subramanian, Khoi A. Phan, Bhanwar Singh, Bharath Rangarajan
Life of this patent
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Abstract
The present invention relates to a system and method of modifying mask layout data to improve the fidelity of mask manufacture. The system and method include determining the difference between the mask layout design and the mask features as written, and generating sizing corrections. The sizing corrections can be used to modify the mask layout data, and/or stored in a database.
Claims60
A method of improving the manufacture of a mask, comprising:
- providing a mask layout, the mask layout including a mask layout feature;
- writing a mask, the mask including a mask feature corresponding to the mask layout feature;
- determining one or more area loss data, the one or more area loss data comprising substantially a difference between a portion of the mask feature and a corresponding portion of the mask layout feature;
- and
- modifying the mask layout in response to the determined one or more area loss data.
A method of improving the manufacture of a mask, comprising:
- providing a mask layout, the mask layout including a mask layout feature;
- writing a mask, the mask including a mask feature corresponding to the mask layout feature;
- determining an area loss for a portion of the mask feature, the area loss comprising substantially a difference between the portion of the mask feature and a corresponding portion of the mask layout feature;
- generating one or more sizing corrections in accordance with the area loss;
- and
- storing the one or more sizing corrections in a database.
A system for manufacturing a mask, comprising:
- an edge detector, the edge detector determining one or more edge data of a portion of a mask feature;
- a processor, the processor receiving the one or more edge data and operatively coupled to an algorithm for calculating one or more area loss data from the one or more edge data;
- and
- a mask writer, the mask writer operatively coupled to the processor to receive the one or more area loss data.
A system for manufacturing a mask, comprising:
- an edge detector, the edge detector determining one or more edge data;
- a processor, the processor receiving the one or more edge data and operatively coupled to one or more algorithms for determining one or more sizing correction data from the one or more edge data;
- and
- a mask writer, the mask writer operatively coupled to the processor to receive the one or more sizing correction data.
A system for manufacturing a mask, comprising:
- a database, the database including one or more sizing correction data, the one or more sizing correction data associated with the difference between a portion of a mask layout feature and a corresponding portion of a mask feature;
- a processor, the processor receiving the one or more sizing correction data and modifying a mask layout in accordance with the one or more sizing correction data;
- and
- a mask writer, the mask writer operatively coupled to the processor to receive the modified mask layout and to generate a mask in accordance with the modified mask layout.
A data storage medium, comprising:
- one or more sizing correction data, the one or more sizing correction data corresponding to one or more area loss data, the one or more area loss data comprising substantially a difference between a portion of a mask layout feature and a portion of a mask feature.
Dependencies are inferred from the claim text.